Patent · US Expired

Optical system

US6912077B2 · kind B2 · utility

10Cited by

0References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Markus Weiss · Aalen, DE
Ulrich Haag · Buxtehude, DE

Key dates

Filing date	Feb 13, 2004
Grant date	Jun 28, 2005
Priority date	—
Expiry date	Feb 13, 2024

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70891
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An optical system, for example a projection exposure apparatus for microlithography, has at least one optical element with an optical surface. A correction radiation device is provided that includes at least one correction radiation source for emitting correction radiation. A scanning device has at least one scanning mirror that is irradiated by the correction radiation and driven in such a way that a defined portion of the optical surface of the optical element is scanned with the correction radiation. This results in a correction of imaging characteristics of the optical element by means of heat which is supplied to the optical element by the correction radiation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.