Exposure apparatus, exposure method, and device manufacturing method
US6914665B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 6, 2003 |
| Grant date | Jul 5, 2005 |
| Priority date | — |
| Expiry date | Aug 6, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/706
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A fiducial plate on which at least one pinhole shaped pattern is formed is fixed on a mask stage, which moves holding a mask. Therefore, for example, wavefront aberration of a projection optical system can be measured without using any special kind of masks for measurement, by setting a wavefront measurement instrument of the attaching type to a substrate stage, illuminating the fiducial plate with an illumination system, and receiving spherical waves generated at the pinhole shaped pattern via projection optical system with the wavefront measurement instrument. Accordingly, the wavefront aberration of the projection optical system can be measured easily, at a desired timing, which allows sufficient quality control to be performed on the projection optical system. As a consequence, the pattern of the mask can be accurately onto the substrate, using the projection optical system on which sufficient quality control is performed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.