Ellipsometric method and control device for making a thin-layered component
US6914675B1 · kind B1 · utility
3Cited by
13References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 11, 1999 |
| Grant date | Jul 5, 2005 |
| Priority date | — |
| Expiry date | Jun 11, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/211
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for controlling the production of an object controlled by a gas panel, by performing an ellipsometric measurement on the object represented by its Mueller matrix; controlling, with a gas panel, the manufacture on the basis of the ellipsometric measurement. Certain parameters of the Mueller matrix are determined in advance, for characterizing the manufacture, and only these parameters are extracted from the ellipsometric measurement during manufacture, the parameters being two different parameters of the ellipsometric angles ψ and Δ and trigonometric functions thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.