Method and apparatus for performing rule-based gate shrink utilizing dipole illumination
US6915505B2 · kind B2 · utility
18Cited by
5References
23Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 25, 2003 |
| Grant date | Jul 5, 2005 |
| Priority date | — |
| Expiry date | Oct 6, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70433
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of printing a gate pattern on a substrate comprising the steps of: identifying at least one area in the pattern in which one of the gate features overlays one of the active regions; reducing a width dimension of the one of the gate features at the location which the one of the gate features overlays the one of the active regions; extracting the gate features from the pattern; decomposing the gate features into a vertical component mask and a horizontal component mask; and illuminating the vertical component mask and the horizontal component mask utilizing dipole illumination.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.