Photo-chemical remediation of Cu-CMP waste
US6916428B2 · kind B2 · utility
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8Claims
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Key dates
| Filing date | Oct 3, 2003 |
| Grant date | Jul 12, 2005 |
| Priority date | — |
| Expiry date | Dec 23, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S210/912
- WIPO fieldEnvironmental technology
- WIPO sectorChemistry
Abstract
A photo-chemical remediation of Cu-CMP waste streams basically includes the following acts: adding photo-catalyst particles into waste streams containing copper ions and organic pollutants and exposing the waste streams to UV light or sunlight to make copper ions become deposited on surfaces of the photo-catalyst particles. Whereby, the copper ions are removed from the waste streams. Meanwhile, organic and inorganic pollutants are decomposed by the photolysis capability of the photo-catalyst to make the waste streams dischargable within environmental standards to the environment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.