Alignment methods for imprint lithography
US6916584B2 · kind B2 · utility
135Cited by
223References
49Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 1, 2002 |
| Grant date | Jul 12, 2005 |
| Priority date | — |
| Expiry date | Dec 20, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/00
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Described are methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. Alignment of the template with the substrate is performed prior to curing the liquid. Alignment of the template with the substrate includes rotational alignment of the template with respect to the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.