Michael Watts
50Patents
24h-index
45Co-inventors
88Inventor score
Filing activity: Mar 30, 1981 → May 3, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6900881B2 | Step and repeat imprint lithography systems | Electricity | 195 | Expired |
| US7077992B2 | Step and repeat imprint lithography processes | Physics | 183 | Expired |
| US6932934B2 | Formation of discontinuous films during an imprint lithography process | Electricity | 182 | Expired |
| US7157036B2 | Method to reduce adhesion between a conformable region and a pattern of a mold | Performing Operations; Transporting | 161 | Expired |
| US6936194B2 | Functional patterning material for imprint lithography processes | Physics | 157 | Expired |
| US8076386B2 | Materials for imprint lithography | Chemistry; Metallurgy | 153 | Active |
| US7070405B2 | Alignment systems for imprint lithography | Performing Operations; Transporting | 147 | Expired |
| US4909631A | Method for film thickness and refractive index determination | Physics | 140 | Expired |
| US6916584B2 | Alignment methods for imprint lithography | Physics | 135 | Expired |
| US5656942A | Prober and tester with contact interface for integrated circuits-containing wafer held docked in a vertical plane | Physics | 120 | Expired |
| US7122482B2 | Methods for fabricating patterned features utilizing imprint lithography | Performing Operations; Transporting | 105 | Expired |
| US7140861B2 | Compliant hard template for UV imprinting | Performing Operations; Transporting | 105 | Expired |
| US7338275B2 | Formation of discontinuous films during an imprint lithography process | Electricity | 84 | Expired |
| US8349241B2 | Method to arrange features on a substrate to replicate features having minimal dimensional variability | Performing Operations; Transporting | 78 | Active |
| US4362809A | Multilayer photoresist process utilizing an absorbant dye | Physics | 77 | Expired |
| US7027156B2 | Scatterometry alignment for imprint lithography | Physics | 62 | Expired |
| US5506676A | Defect detection using fourier optics and a spatial separator for simultaneous optical computing of separated fourier transform components | Physics | 59 | Expired |
| US8066930B2 | Forming a layer on a substrate | Performing Operations; Transporting | 55 | Active |
| US7090716B2 | Single phase fluid imprint lithography method | Emerging Cross-Sectional Technologies | 43 | Expired |
| US6980282B2 | Method for modulating shapes of substrates | Physics | 43 | Expired |
| US7019819B2 | Chucking system for modulating shapes of substrates | Performing Operations; Transporting | 41 | Expired |
| US7071088B2 | Method for fabricating bulbous-shaped vias | Electricity | 33 | Expired |
| US7281921B2 | Scatterometry alignment for imprint lithography | Physics | 32 | Expired |
| US5966212A | High-speed, high-resolution, large area inspection using multiple optical fourier transform cells | Physics | 31 | Expired |
| US6926929B2 | System and method for dispensing liquids | Physics | 24 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.