Planar reticle design/fabrication method for rapid inspection and cleaning
US6919146B2 · kind B2 · utility
2Cited by
6References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 25, 2002 |
| Grant date | Jul 19, 2005 |
| Priority date | — |
| Expiry date | Jan 31, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/151
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A reticle has a transparent substrate, mask shapes on the substrate, a transparent material covering the mask shapes and an optional anti-reflective material over the transparent material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.