Inventor · Cohoes, NY, US

Daniel A. Corliss

31Patents
5h-index
44Co-inventors
69Inventor score

Filing activity: Jun 28, 1991 → Dec 28, 2020

Most-cited inventions

PatentTitleAreaCited byStatus
US5427878A Semiconductor wafer processing with across-wafer critical dimension monitoring using optical endpoint detection Physics 81 Expired
US5280437A Structure and method for direct calibration of registration measurement systems to actual semiconductor wafer process topography Electricity 18 Expired
US10553522B1 Semiconductor microcooler Electricity 12 Active
US7439001B2 Focus blur measurement and control method Physics 9 Active
US7230681B2 Method and apparatus for immersion lithography Physics 5 Expired
US10553516B1 Semiconductor microcooler Electricity 4 Active
US10642161B1 Baseline overlay control with residual noise reduction Physics 4 Active
US10347486B1 Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography Electricity 3 Active
US10274836B2 Determination of lithography effective dose uniformity Physics 3 Active
US6919146B2 Planar reticle design/fabrication method for rapid inspection and cleaning Emerging Cross-Sectional Technologies 2 Expired
US11037786B2 Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography Electricity 2 Active
US10281826B2 Determination of lithography effective dose uniformity Physics 1 Active
US9104113B2 Amplification method for photoresist exposure in semiconductor chip manufacturing Physics 1 Active
US9709898B2 Amplification method for photoresist exposure in semiconductor chip manufacturing Physics 1 Active
US10490481B1 Copper microcooler structure and fabrication Electricity 1 Active
US10921715B2 Semiconductor structure for optical validation Physics 1 Active
US7807335B2 Immersion lithography contamination gettering layer Emerging Cross-Sectional Technologies 1 Active
US10429743B2 Optical mask validation Physics 1 Active
US10650111B2 Electrical mask validation Physics 1 Active
US10937764B2 Three-dimensional microelectronic package with embedded cooling channels Electricity 1 Active
US8350235B2 Semiconductor intra-field dose correction Physics 1 Active
US10921716B1 Lithographic dose characterization Physics 0 Active
US11049789B2 Semiconductor microcooler Electricity 0 Active
US9451684B2 Dual pulse driven extreme ultraviolet (EUV) radiation source method Electricity 0 Active
US11177130B2 Patterning material film stack with metal-containing top coat for enhanced sensitivity in extreme ultraviolet (EUV) lithography Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.