Gas distribution system
US6921437B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 26, 2004 |
| Grant date | Jul 26, 2005 |
| Priority date | — |
| Expiry date | May 26, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45574
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention provides a gas distribution apparatus useful in semiconductor manufacturing. The gas distribution apparatus comprises a unitary member and a gas distribution network formed within the unitary member for uniformly delivering a gas into a process region. The gas distribution network is formed of an inlet passage extending upwardly through the upper surface of the unitary member for connecting to a gas source, a plurality of first passages converged at a junction and connected with the inlet passage at the junction, a plurality of second passages connected with the plurality of first passages, and a plurality of outlet passages connected with the plurality of second passages for delivering the gas into a processing region. The first passages extend radially and outwardly from the junction to the periphery surface of the unitary member, and the second passages are non-perpendicular to the first passages and extend outwardly from the first passages to the periphery surface. The outlet passages extend downwardly through the lower surface of the unitary member for delivering the gas into the processing region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.