Photosensitive bilayer composition
US6929897B2 · kind B2 · utility
2Cited by
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64Claims
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Key dates
| Filing date | Aug 19, 2004 |
| Grant date | Aug 16, 2005 |
| Priority date | — |
| Expiry date | Aug 19, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/126
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Polymers and co-polymers having monomeric units formed by the polymerization of monomers of the Structure I where R1 is a moiety containing an ethylenically unsaturated polymerizable group, R2 is a C1-C3 alkylene group, and R3 is a C1-10 linear or cyclic alkyl group, a C6-10 aromatic or substituted aromatic group, a C1-8 alkoxy methyl, or a C1-8 alkoxy ethyl group, are useful as binder resins for photosensitive compositions, and processes for photolithography in the production of semiconductor devices and materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.