Method of monitoring introduction on interfacial species

US6929964B2 · kind B2 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Lance Genicola · Whitehall, US
• Mark J. Hurley · Poughkeepsie, US
• Jeremy J. Kempisty · Beacon, US
• Paul Kirsch · Fishkill, US
• Ravikumar Ramachandran · Beacon, US
• Suri Hedge · Hollowville, US

Key dates

• Filing date: Sep 17, 2003
• Grant date: Aug 16, 2005
• Expiry date: Sep 17, 2023

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/28167
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A method for monitoring a nitridation process, including: (a) providing a semiconductor substrate; (b) forming a first dielectric layer on a top surface of the substrate; (c) introducing a quantity of interfacial species into the substrate; (d) removing the first dielectric layer; (e) forming a second dielectric layer on the top surface of the substrate; (f) measuring the density of interface traps between the substrate and the second dielectric layer; (g) providing a predetermined relationship between the quantity of the interfacial species and the density of the interface traps; and (h) determining the quantity of the interfacial species introduced based on the relationship.