Transparent conductive film formation process, photovoltaic device production process, transparent conductive film, and photovoltaic device
US6930025B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 31, 2002 |
| Grant date | Aug 16, 2005 |
| Priority date | — |
| Expiry date | Mar 1, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In a process for forming on a substrate a transparent conductive film having crystallizability, the process comprises a first step of forming a film at a first film formation rate and a second step of forming a film at a second film formation rate, and the relationship between film formation rates in the respective steps satisfies:2≦(second film formation rate)/(first film formation rate)≦100;which provides a process for producing a transparent conductive film by a deposition process advantageous for cost reduction, which can form in a short time a transparent conductive film having an uneven surface profile with a high light-confining effect, and can bring about an improvement in photovoltaic performance and enjoy a high mass productivity when applied to the formation of multi-layer structure of photovoltaic devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.