Formation of discontinuous films during an imprint lithography process
US6932934B2 · kind B2 · utility
182Cited by
180References
55Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 11, 2002 |
| Grant date | Aug 23, 2005 |
| Priority date | — |
| Expiry date | Sep 15, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0271
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
The present invention is directed to methods for patterning a substrate by imprint lithography. An imprint lithography method includes placing a curable liquid on a substrate. A template may be contacted with the curable liquid. Surface forces at the interface of the curable liquid and the template cause the curable liquid to gather in an area defined by a lower surface of the template. Alternately, the curable liquid may fill one or more relatively shallow recesses in the template and the area under the template lower surface. Activating light is applied to the curable liquid to form a patterned layer on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.