Gas flushing system for use in lithographic apparatus
US6933513B2 · kind B2 · utility
5Cited by
17References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 8, 2002 |
| Grant date | Aug 23, 2005 |
| Priority date | — |
| Expiry date | May 8, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70933
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a lithographic apparatus using exposure radiation of a relatively short wavelength, e.g. 157 or 126 nm, a laminar flow of N2 is provided across parts of the beam path in or adjacent to moving components of the apparatus. A variety of structures may be used to provide the laminar flow including a screen, a settling chamber, an angled inlet port and a flow path having increasing cross-sectional area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.