Retarding electron beams in multiple electron beam pattern generation
US6936981B2 · kind B2 · utility
42Cited by
10References
28Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 8, 2002 |
| Grant date | Aug 30, 2005 |
| Priority date | — |
| Expiry date | Dec 16, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31779
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A multiple electron beam pattern generator includes a multiple electron beam source to generate a plurality of electron beams that are modulated according to a pattern. An anode accelerates the electron beams, and then a beam retarding system generates a retarding electric potential about the electron beams to decrease the kinetic energy of the electron beams substantially near a substrate. A beam scanner scans the electron beams across the substrate. A substrate support supports the substrate, and a pattern is generated on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.