Method of making photonic devices with SOG interlayer
US6937806B2 · kind B2 · utility
1Cited by
6References
33Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 21, 2002 |
| Grant date | Aug 30, 2005 |
| Priority date | — |
| Expiry date | Feb 27, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12038
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of making a photonic device having at least two layers formed over a substrate, preferably by plasma enhanced chemical vapor deposition, involves depositing a thin spin-on glass (SOG) interlayer between at least one adjacent pair of layers to improve the roughness characteristics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.