Process chamber having component with yttrium-aluminum coating
US6942929B2 · kind B2 · utility
65Cited by
34References
27Claims
0Family size
Inventors
Key dates
| Filing date | Jan 8, 2002 |
| Grant date | Sep 13, 2005 |
| Priority date | — |
| Expiry date | Apr 8, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/26
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A substrate processing chamber component is a structure having an integral surface coating comprising an yttrium-aluminum compound. The component may be fabricated by forming a metal alloy comprising yttrium and aluminum into the component shape and anodizing its surface to form an integral anodized surface coating. The chamber component may be also formed by ion implanting material in a preformed metal shape. The component may be one or more of a chamber wall, substrate support, substrate transport, gas supply, gas energizer and gas exhaust.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.