Reduction of positional errors in a four point probe resistance measurement
US6943571B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 18, 2003 |
| Grant date | Sep 13, 2005 |
| Priority date | — |
| Expiry date | Jul 27, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R27/14
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and method for measuring a resistance or a resistance per square, Rsq, of a material having a surface using a multi-point probe including four or more collinear contact points placed in the interior of the sample, the method including: making a first measurement using a first set of probe electrodes for inducing a current and a second set of probe electrodes for measuring the voltage difference when the current is induced; making a second measurement using a set of probe electrodes different from the first set for inducing a current and a set of probe electrodes different from the second set for measuring the voltage difference when the current is induced; and using a known relationship among the currents induced, the voltages measured, the nominal probe positions and the resistance per square to determine the resistance per square such that measurement errors resulting from positioning of the probes are reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.