Method for monitoring and/or controlling the status of a plasma in a plasma spectrometer and spectrometer for implementing such a method
US6943879B2 · kind B2 · utility
1Cited by
12References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 9, 2001 |
| Grant date | Sep 13, 2005 |
| Priority date | — |
| Expiry date | Apr 11, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/0037
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for monitoring and/or controlling the positioning and/or condition of a plasma in a plasma spectrometer, which comprises: Application to inductively coupled high frequency plasma optical emission and mass spectrometers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.