Method for correcting oscillation-induced imaging errors in an objective
US6943965B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 27, 2003 |
| Grant date | Sep 13, 2005 |
| Priority date | — |
| Expiry date | Jan 27, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/709
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a method for correcting oscillation-induced imaging errors in an objective, in particular a projection objective in microlithography for fabricating semiconductor elements, an at least first objective part and a second objective part are provided. In this case, the first objective part has a first optical axis and the second objective part has an optical axis which deviates from the first optical axis. Beam deflection takes place between the two objective parts via at least one optical beam deflection element. The oscillations occurring in the second objective part are measured and evaluated by means of a sensor system. The results are used as input data for a device, which adjusts the beam direction in the objective, in such a way that imaging errors occurring as a result of the oscillations of the second objective part are compensated for.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.