Alexander Kohl
30Patents
7h-index
57Co-inventors
68Inventor score
Filing activity: Oct 18, 2001 → Apr 26, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7511886B2 | Optical beam transformation system and illumination system comprising an optical beam transformation system | Physics | 56 | Expired |
| US6580570B2 | Mounting apparatus for an optical element | Physics | 33 | Expired |
| US7193794B2 | Adjustment arrangement of an optical element | Physics | 18 | Expired |
| US6816325B1 | Mounting apparatus for an optical element | Physics | 16 | Expired |
| US6879379B2 | Projection lens and microlithographic projection exposure apparatus | Physics | 15 | Expired |
| US9599904B2 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Physics | 14 | Active |
| US7304717B2 | Imaging device in a projection exposure facility | Physics | 8 | Expired |
| US7710542B2 | Imaging device in a projection exposure machine | Physics | 6 | Active |
| US7486382B2 | Imaging device in a projection exposure machine | Physics | 5 | Active |
| US6963449B2 | Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method | Emerging Cross-Sectional Technologies | 5 | Expired |
| US7027237B2 | Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method | Emerging Cross-Sectional Technologies | 5 | Expired |
| US8467031B2 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Physics | 5 | Active |
| US7961294B2 | Imaging device in a projection exposure facility | Physics | 5 | Active |
| US6943965B2 | Method for correcting oscillation-induced imaging errors in an objective | Physics | 4 | Expired |
| US6728021B1 | Optical component and method of inducing a desired alteration of an optical property therein | Physics | 3 | Expired |
| US9310694B2 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Physics | 3 | Active |
| US8085382B2 | Microlithographic projection exposure apparatus illumination optics | Physics | 3 | Active |
| US6842294B2 | Catadioptric objective | Physics | 2 | Expired |
| US7079331B2 | Device for holding a beam splitter element | Physics | 2 | Expired |
| US10191382B2 | Illumination system for illuminating a mask in a microlithographic exposure apparatus | Physics | 1 | Active |
| US9223226B2 | Microlithographic projection exposure apparatus illumination optics | Physics | 1 | Active |
| US7656595B2 | Adjustment arrangement of an optical element | Physics | 1 | Active |
| US7457059B2 | Adjustment arrangement of an optical element | Physics | 1 | Active |
| US9052611B2 | Microlithographic projection exposure apparatus illumination optics | Physics | 1 | Active |
| US7014328B2 | Apparatus for tilting a carrier for optical elements | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.