Method and apparatus for monitoring molecular contamination of critical surfaces using coated SAWS
US6945090B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 24, 2002 |
| Grant date | Sep 20, 2005 |
| Priority date | — |
| Expiry date | Nov 30, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2291/0426
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A molecular contamination monitor for monitoring molecular contamination on a surface of a subject surface susceptible to degradation by a molecular contaminant. The monitor includes a surface acoustic wave (SAW) device having a SAW measurement surface coated with a material that is equivalent to the subject material with respect to spontaneous contamination by a contaminant. In the preferred embodiment, the coating comprises the same material as the subject surface or a material that interacts chemically with the contaminant in an equivalent manner to the subject surface. Exemplary coatings include: photoresist, copper, silver, gold, platinum, titanium, tungsten, aluminum, nickel, metal oxides, stearic acid, silicon, gallium arsenide, gallium nitride, germanium, silicon germanium, silicon dioxide, silicon nitride, and glass. Exemplary coating methods include sputtering, CVD, ALD and misted deposition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.