Catoptric projection optical system, exposure apparatus and device fabrication method using same
US6947210B2 · kind B2 · utility
20Cited by
8References
5Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 6, 2003 |
| Grant date | Sep 20, 2005 |
| Priority date | — |
| Expiry date | May 15, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70275
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A catoptric projection optical system for projecting a pattern on an object surface onto an image surface and for serving as an imaging system that forms an intermediate image includes first, second, third and fourth mirrors serving substantially as a coaxial system so as to sequentially reflect light from an object side to an image side, and being arranged so that light from the object surface to the first mirror may intersect light from the second mirror to the third mirror.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.