Patent · US Expired

System and method for processing semiconductor wafers using different wafer processes

US6949177B2 · kind B2 · utility

3Cited by
3References
30Claims
0Family size

Assignee

Inventor

Key dates

Filing dateAug 16, 2001
Grant dateSep 27, 2005
Priority date
Expiry dateJan 5, 2023

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/67751
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A system and method for processing semiconductor wafers using different wafer processes utilizes multiple processing assemblies to efficiently perform these wafer processes. The wafer processes performed by the processing assemblies may vary with respect to operating parameters or the types of wafer processes, which allows customization of the wafer processes. Each of the processing assemblies is configured to sequentially process two or more semiconductor wafers at different processing positions by sequentially transferring the semiconductor wafers to the different processing positions using a wafer transfer carousel. As the semiconductor wafers are processes at one of the processing assemblies, the processed semiconductor wafers are sequentially transferred to the next processing assembly in an efficient manner. The sequential processing of the semiconductor wafers at each of the processing assemblies and the sequential transferring of the wafers contribute to an increased throughput.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.