Self-aligned contact areas for sidewall image transfer formed conductors

US6949458B2 · kind B2 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Edward W. Conrad · Jeffersonville, US
• Chung H. Lam · Williston, US
• Dale W. Martin · Hyde Park, US
• Edmund J. Sprogis · Underhill, US

Key dates

• Filing date: Feb 10, 2003
• Grant date: Sep 27, 2005
• Expiry date: Feb 10, 2023

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T29/49165
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A method and structure for forming a sidewall image transfer conductor having a contact pad includes forming an insulator to include a recess, depositing a conductor around the insulator, and etching the conductor to form the sidewall image transfer conductor, wherein the conductor remains in the recess and forms the contact pad and the recess is perpendicular to the sidewall image transfer conductor.