Edward W. Conrad
34Patents
13h-index
36Co-inventors
77Inventor score
Filing activity: Dec 31, 1992 → Nov 24, 2010
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5963329A | Method and apparatus for measuring the profile of small repeating lines | Physics | 302 | Expired |
| US6425112B1 | Auto correction of error checked simulated printed images | Physics | 220 | Expired |
| US6016357A | Feedback method to repair phase shift masks | Physics | 114 | Expired |
| US7627622B2 | System and method of curve fitting | Physics | 86 | Active |
| US6373975B1 | Error checking of simulated printed images with process window effects included | Physics | 54 | Expired |
| US5980647A | Metal removal cleaning process and apparatus | Performing Operations; Transporting | 46 | Expired |
| US6735492B2 | Feedback method utilizing lithographic exposure field dimensions to predict process tool overlay settings | Physics | 42 | Expired |
| US6238850A | Method of forming sharp corners in a photoresist layer | Physics | 38 | Expired |
| US6395438B1 | Method of etch bias proximity correction | Physics | 24 | Expired |
| US6528219B1 | Dynamic alignment scheme for a photolithography system | Physics | 20 | Expired |
| US6214494A | Serif mask design methodology based on enhancing high spatial frequency contribution for improved printability | Physics | 20 | Expired |
| US5325180A | Apparatus for identifying and distinguishing temperature and system induced measuring errors | Electricity | 18 | Expired |
| US6383719B1 | Process for enhanced lithographic imaging | Physics | 16 | Expired |
| US6922600B1 | System and method for optimizing manufacturing processes using real time partitioned process capability analysis | Emerging Cross-Sectional Technologies | 13 | Expired |
| US6704695B1 | Interactive optical proximity correction design method | Physics | 11 | Expired |
| US6539321B2 | Method for edge bias correction of topography-induced linewidth variation | Physics | 11 | Expired |
| US6566759B1 | Self-aligned contact areas for sidewall image transfer formed conductors | Emerging Cross-Sectional Technologies | 9 | Expired |
| US6694498B2 | Feed-forward lithographic overlay offset method and system | Physics | 8 | Expired |
| US6268908A | Micro adjustable illumination aperture | Physics | 8 | Expired |
| US7257247B2 | Mask defect analysis system | Physics | 7 | Expired |
| US6261724A | Method of modifying a microchip layout data set to generate a predicted mask printed data set | Physics | 7 | Expired |
| US6879719B1 | Method for measurement of full-two dimensional submicron shapes | Physics | 7 | Expired |
| US6949458B2 | Self-aligned contact areas for sidewall image transfer formed conductors | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6965808B1 | System and method for optimizing metrology sampling in APC applications | Physics | 5 | Expired |
| US6387596B2 | Method of forming resist images by periodic pattern removal | Physics | 4 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.