Platen with peripheral frame for supporting a web of polishing material in a chemical mechanical planarization system
US6951511B2 · kind B2 · utility
3Cited by
28References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 17, 2002 |
| Grant date | Oct 4, 2005 |
| Priority date | — |
| Expiry date | Mar 15, 2023 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B21/20
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Generally, a method and apparatus for supporting a web of polishing material. In one embodiment, the apparatus includes a platen adapted to support the web, a frame assembly, and one or more flexures coupled between the platen and the frame assembly. The flexure allows the frame assembly to be moved in relation to the platen. When the frame assembly is in an extended position relative to the platen, the web is placed in a spaced-apart relation to the platen.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.