Micro device and process for producing it

US6953751B2 · kind B2 · utility

Assignee

• NanoWorld AG · CH

Inventors

• Manfred Detterbeck · Wendelstein, DE
• Stefan Lutter · Neuchâtel, CH
• Mathieu Burri · Court, CH
• Theo Hartmann · Lauda, DE
• Terunobu Akiyama · Neuchâtel, CH

Key dates

• Filing date: Jul 30, 2003
• Grant date: Oct 11, 2005
• Expiry date: Sep 22, 2023

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/16
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A micro device comprising a SU-8 photoresist layer adhered to a thin layer of, for example, silicon nitride, silicon oxide, metal, and diamond. The SU-8 layer is clamped on the thin layer by using an under-etching technique.