Patent · US Expired

Method for generating a protective cover for a device

US6955950B2 · kind B2 · utility

6Cited by

4References

20Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Robert Aigner · Winter Garden, US
Martin Franosch · Munich, DE
Andreas Meckes · Munich, DE
Klaus-Gunter Oppermann · Holzkirchen, DE
Marc Strasser · Munich, DE

Key dates

Filing date	Jul 9, 2004
Grant date	Oct 18, 2005
Priority date	—
Expiry date	Jul 9, 2024

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB81C2203/0145
WIPO fieldMicro-structural and nano-technology
WIPO sectorChemistry

Abstract

In a method for generating a protective cover for a device, where a substrate is provided, which comprises the device, first, a sacrificial pattern is generated on the substrate. The sacrificial pattern covers at least an area of the substrate, which comprises the device. Then, a polymer layer is deposited, which comprises at least on sacrificial pattern. Then, an opening will be formed in the polymer layer to expose a portion of the sacrificial pattern. Then, the sacrificial pattern will be removed and the formed opening in the polymer layer is closed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.