Composition and method for removing copper-compatible resist
US6958312B2 · kind B2 · utility
15Cited by
6References
5Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 9, 2002 |
| Grant date | Oct 25, 2005 |
| Priority date | — |
| Expiry date | Oct 9, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A composition for removing a copper-compatible resist includes about 10% to about 30% by weight of an amine compound, about 10% to about 80% by weight of a glycolether compound, and about 10% to about 80% by weight of a polar solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.