Patent · US Expired

Aberration measuring method and projection exposure apparatus

US6960415B2 · kind B2 · utility

4Cited by
6References
9Claims
0Family size

Assignee

Inventor

Key dates

Filing dateOct 1, 2002
Grant dateNov 1, 2005
Priority date—
Expiry dateJun 6, 2023

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/706
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method of measuring aberration of a projection optical system. The method includes the steps of imaging a test pattern through the projection optical system, and measuring a potential deviation amount of the image of the test pattern and measuring aberration of the project optical system on the basis of the positional deviation amount. The measuring step includes a process of determining a coefficient of a particular Zernike term and a process of changing a position or a shape of a region on a pupil plane of the projection optical system before light from the test pattern passes therethrough, in accordance with the particular Zernike term.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.