System and method for maskless lithography using an array of improved diffractive focusing elements

US6960773B2 · kind B2 · utility

Assignee

• Massachusetts Institute of Technology · US

Inventors

• Rajesh Menon · Boston, US
• Dario Gil · Mount Kisco, US
• David J. Carter · Concord, US
• Henry I. Smith · Sudbury, US
• George Barbastathis · Boston, US

Key dates

• Filing date: Jul 21, 2003
• Grant date: Nov 1, 2005
• Expiry date: Jul 21, 2023

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70358
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A maskless lithography system is disclosed that includes an array of blazed diffractive zone plates, each of which focuses an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate in certain embodiments. In further embodiments, an array of apodized diffractive elements may also be used.