Interference system and semiconductor exposure apparatus having the same
US6961132B2 · kind B2 · utility
0Cited by
10References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 28, 2003 |
| Grant date | Nov 1, 2005 |
| Priority date | — |
| Expiry date | Oct 28, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J9/02
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An exposure apparatus for exposing a substrate with a pattern of an original includes a projection optical system for projecting the pattern of the original onto the substrate with light from a light source, and an interferometer for measuring an optical characteristic of the projection optical system by use of the light from the light source, which passes a pinhole and the projection optical system. The pinhole has a diameter which is smaller than a diameter of an Airy disc.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.