Reflectometer and method for manufacturing a reflectometer
US6961174B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 15, 2000 |
| Grant date | Nov 1, 2005 |
| Priority date | — |
| Expiry date | Oct 13, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01D5/347
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A reflection-type graduation having a silicon substrate. The silicon substrate has first subsections formed thereon. Each of the first subsections has etched oblique surfaces. The surfaces are positioned so that light beams directed incident to the surfaces cause no retroreflection. The substrate also includes second subsections having relatively higher reflecting properties as compared to the first subsections. The first subsections and second subsections are alternatively disposed on the substrate in a first direction.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.