Patent · US Expired

Reflectometer and method for manufacturing a reflectometer

US6961174B1 · kind B1 · utility

2Cited by
10References
36Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 15, 2000
Grant dateNov 1, 2005
Priority date
Expiry dateOct 13, 2021

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01D5/347
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A reflection-type graduation having a silicon substrate. The silicon substrate has first subsections formed thereon. Each of the first subsections has etched oblique surfaces. The surfaces are positioned so that light beams directed incident to the surfaces cause no retroreflection. The substrate also includes second subsections having relatively higher reflecting properties as compared to the first subsections. The first subsections and second subsections are alternatively disposed on the substrate in a first direction.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.