Patent · US Expired

Apparatus and manufacturing process of carbon nanotube gate field effect transistor

US6962839B2 · kind B2 · utility

15Cited by
7References
4Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 29, 2004
Grant dateNov 8, 2005
Priority date
Expiry dateJul 29, 2024

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/938
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

The present invention generally relates to an apparatus and method of carbon nanotube (CNT) gate field effect transistor (FET), which is used to replace the current metal gate of transistor for decreasing the gate width greatly. The carbon nanotube has its own intrinsic characters of metal and semiconductor, so it can be the channel, connector or next-level gate of transistor. Furthermore, the transistor has the structure of exchangeable source and drain, and can be defined the specificity by outside wiring.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.