Positioning system and exposure apparatus having the same
US6965426B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 28, 2003 |
| Grant date | Nov 15, 2005 |
| Priority date | — |
| Expiry date | Oct 28, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70766
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a positioning system effective to cancel a moment reaction force, and it includes a movable portion and a reaction force absorbing mechanism for absorbing a propulsion reaction force to be produced by motion of the movable portion. A first distance between a reference plane and a gravity center position of the movable portion, being supported for movement along the reference plane, and a second distance between the reference plane and a gravity center position of the reaction force absorbing mechanism are made substantially equal to each other, and/or the second distance and a third distance between the reference plane and a motor movable element for propelling the movable portion along the reference plane are made substantially equal to each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.