Non-invasive wafer transfer position diagnosis and calibration
US6965432B2 · kind B2 · utility
2Cited by
4References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 7, 2002 |
| Grant date | Nov 15, 2005 |
| Priority date | — |
| Expiry date | Apr 8, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/681
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An apparatus and method for detecting mispositioned wafers attributable to transfer shift of the wafer are disclosed. A calibration wafer has a target region comprising a pattern of optically distinguishable features from which is determined the position of the calibration wafer within the chamber subsequent to its transfer therein. Preferably, the features comprise a pattern of colors that can be detected by spectroscopy. A preferred form and manner of providing such color features is by way of dielectric thin film filters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.