Method and device for the generation of far ultraviolet or soft x-ray radiation

US6967341B2 · kind B2 · utility

Assignees

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE
• Philips Corporate Intellectual Property GmbH · DE
• KONINKLIJKE PHILIPS ELECTRONICS NV · NL

Inventors

• Willi Neff · Kelmis, BE
• Klaus Bergmann · Heilbronn, DE
• Oliver Rosier · Jüchen, DE
• Joseph Pankert · Aachen, DE

Key dates

• Filing date: Mar 21, 2002
• Grant date: Nov 22, 2005
• Expiry date: Jul 8, 2022

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70033
• WIPO field: Medical technology
• WIPO sector: Instruments

Abstract

In a method for generating extreme ultraviolet radiation or soft x-ray radiation by means of gas discharge, in particular, for EUV lithography, a discharge vessel is provided with two electrodes that are connected to high voltage. Between the electrodes, in an area of two electrode recesses that are coaxial to one another, a gas fill with predetermined gas pressure in accordance with a discharge operation realized on the left branch of the Paschen curve is provided. In this area, a plasma emitting the radiation is generated when supplying energy. The plasma is displaced or deformed by a pressure change of the gas fill in the area of the electrode recesses.