Reactor precoating for reduced stress and uniform CVD
US6974781B2 · kind B2 · utility
516Cited by
50References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 20, 2003 |
| Grant date | Dec 13, 2005 |
| Priority date | — |
| Expiry date | Nov 30, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02211
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method is provided for obtaining stable and elevated deposition rates in a reaction chamber, following the cleaning of the chamber. The method involves cleaning of the chamber, pre-coating the interior surfaces of the reaction chamber with an inorganic composition, and then, using the pre-coated chamber to deposit an organic layer onto a workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.