Wafer carrier with ultraphobic surfaces
US6976585B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 3, 2003 |
| Grant date | Dec 20, 2005 |
| Priority date | — |
| Expiry date | Jan 4, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67366
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A carrier with ultraphobic surfaces for promoting more effective cleaning and drying of the carrier. In the invention, entire surfaces or portions of surfaces of a carrier are made ultraphobic. The ultraphobic surfaces of the carrier cause liquids that may come in contact with the surface, such as may be used in cleaning, to quickly and easily “roll off” without leaving a liquid film or substantial number of liquid droplets. As a result, less time and energy is expended in drying the surfaces, and redeposited residue is minimized, thereby improving overall process quality. In addition, the ultraphobic surfaces may be resistant to initial deposition of contaminants, where the contaminants may be in liquid or vapor form.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.