Apparatus and method for producing a semiconductor device including a byproduct control system
US6979368B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 3, 2004 |
| Grant date | Dec 27, 2005 |
| Priority date | — |
| Expiry date | Jun 30, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4412
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus includes a reaction chamber installed in a reaction furnace; a discharge port for removing from the reaction chamber reaction byproducts formed during producing of the semiconductor device; a heater for generating heat to the reaction chamber; and a hot fluid supply unit for introducing heat from the heater and the reaction chamber into the discharge port. The hot fluid supply unit further comprises a fluid container for receiving a heat transfer fluid. The apparatus includes a hot fluid generator adjacent the reaction chamber in the reaction furnace. The hot fluid generator defines a fluid channel for conveying the heat transfer fluid and transfers heat generated from the heater and the reaction chamber to the heat transfer fluid supplied from the fluid container. The apparatus also includes a heat transfer element for transferring heat to the discharge port using the heat transfer fluid supplied from the hot fluid generator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.