Immersion photolithography system and method using inverted wafer-projection optics interface
US6980277B2 · kind B2 · utility
29Cited by
2References
35Claims
0Family size
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Key dates
| Filing date | Apr 26, 2004 |
| Grant date | Dec 27, 2005 |
| Priority date | — |
| Expiry date | Jun 1, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70233
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation, and also includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides a liquid between the projection optical system and the substrate. The projection optical system is positioned below the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.