Reticle and optical characteristic measuring method
US6982786B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 3, 2002 |
| Grant date | Jan 3, 2006 |
| Priority date | — |
| Expiry date | Dec 18, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70275
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In an optical characteristic measuring method for measuring an optical characteristic of a projection optical system (10a), a reticle (9) having a plurality of patterns (TP) is supplied, and scattered light from an aperture is directed to the plurality of patterns (TP), whereby light beams are projected onto the plurality of patterns in mutually different directions, by which images of the plurality of patterns are formed through the projection optical system (10a). Positions of images of the plurality of patterns, respectively, are detected and, by use of the result of detection, the optical characteristic of the projection optical system is detected. This accomplishes an optical characteristic measuring method and a reticle to be used therefor, which are suitable for measuring an optical characteristic of an optical system such as wavefront aberration, for example, at high precision.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.