Light source device and exposure equipment using the same
US6987279B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Dec 20, 2004 |
| Grant date | Jan 17, 2006 |
| Priority date | — |
| Expiry date | Dec 20, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70916
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A light source device capable of extending the life of a collector mirror and reducing running cost by protecting the collector mirror from debris that is considered harmful to a mirror coating while securing the collection solid angle and collection rate of EUV light. The light source device includes a target supply unit for supplying a material to become the target; a laser unit for generating plasma by applying a laser beam to the target; a collection optical system for collecting the extreme ultra violet light radiating from the plasma and emitting the extreme ultra violet light; and magnetic field generating unit for generating a magnetic field within the collection optical system when supplied with current so as to trap charged particles radiating from the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.