System and method for on-the-fly eccentricity recognition
US6990430B2 · kind B2 · utility
520Cited by
17References
39Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 18, 2003 |
| Grant date | Jan 24, 2006 |
| Priority date | — |
| Expiry date | Dec 18, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68707
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of substrate eccentricity detection includes includes determining at least three positions on a perimeter of a first substrate, grouping the at least three perimeter positions to define one or more circles, estimating a location of a center of the first substrate as the location of a center of a predetermined circle approximated from the at least three perimeter positions, and determining an eccentricity vector as a difference between the estimated location and a reference position on a substrate transport mechanism on which the first substrate rests.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.