Method of making a substrate having buried structure and method for fabricating a display device including the substrate
US6992008B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Oct 1, 2004 |
| Grant date | Jan 31, 2006 |
| Priority date | — |
| Expiry date | Oct 1, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/136213
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of making a substrate having a buried structure includes the steps of preparing a glass substrate having a principal surface, forming a groove on the principal surface of the glass substrate by a wet etching process, and depositing a first material over the principal surface of the glass substrate and filling the groove with the first material to form the buried structure having a surface that is substantially flush with the principal surface. The step of forming the groove includes the step of performing the wet etching process by using an etchant that includes hydrofluoric acid, ammonium fluoride, and hydrochloric acid or oxalic acid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.