Device including an amorphous carbon layer for improved adhesion of organic layers and method of fabrication
US6992371B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 16, 2004 |
| Grant date | Jan 31, 2006 |
| Priority date | — |
| Expiry date | Jul 16, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/09
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A novel device, such as a semiconductor device, a microfluidic device, a surface acoustic wave device an imprint template, or the like, including an amorphous carbon layer for improved adhesion of organic layers and method of fabrication. The device includes a substrate having a surface, an amorphous carbon layer, formed overlying the surface of the substrate, and a low surface energy material layer overlying the surface of the substrate. The device is formed by providing a substrate having a surface, depositing a low surface energy material layer and an amorphous carbon layer overlying the surface of the substrate adjacent the low surface energy material layer using plasma enhanced chemical vapor deposition (PECVD) or sputtering.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.