Projection optical system, exposure apparatus, and device manufacturing method
US6995833B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 21, 2004 |
| Grant date | Feb 7, 2006 |
| Priority date | — |
| Expiry date | Jul 22, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70275
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A projection optical system for projecting an image of a first object onto a second object includes a first imaging optical system that forms a first intermediate image of the first object, and includes a lens, a second imaging optical system that forms a second intermediate image of the first object, and includes a lens and a concave mirror, and a third imaging optical system that forms an image of the first object onto the second object, and includes a lens, wherein the first, second and third imaging optical systems are arranged along an optical path from the first object in this order, and 0.7<|β1·β2|<3.0 is met where β1 is a paraxial magnification of the first imaging optical system, and β2 is a paraxial magnification of the second imaging optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.