Exposure apparatus and device manufacturing method including gas purging of a space containing optical components
US6999159B2 · kind B2 · utility
2Cited by
11References
2Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 14, 2005 |
| Grant date | Feb 14, 2006 |
| Priority date | — |
| Expiry date | Jun 14, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70883
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes an illumination optical system for illuminating an original with ultraviolet light, a projection optical system for projecting a pattern of the original onto a substrate to be exposed, and a gas purging device for replacing an inside space, where optical components of at least one of the illumination optical system and the projection optical system are placed, with a gas containing substantially no water content or an inert gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.